| 发明名称 |
Method of film deposition, and fabrication of structures |
| 摘要 |
A method of fabricating aluminum oxide films utilizing aluminum alkoxide precursors is described. The aluminum oxide film is formed by (a) providing an aluminum alkoxide precursor that is dissolved, emulsified or suspended in a liquid; (b) providing a vapor generated from the aluminum alkoxide precursor; and (c) depositing an aluminum oxide film:on the substrate at a temperature greater than 500° C.
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| 申请公布号 |
US6664186(B1) |
申请公布日期 |
2003.12.16 |
| 申请号 |
US20000676882 |
申请日期 |
2000.09.29 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CALLEGARI ALESSANDRO C.;NEUMAYER DEBORAH ANN |
| 分类号 |
C23C16/40;C23C16/44;C23C16/455;H01L21/28;H01L21/316;H01L21/8238;H01L27/08;H01L29/49;H01L29/51;(IPC1-7):H01L21/44;H01L21/31 |
主分类号 |
C23C16/40 |
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