Method of forming pattern

摘要

A pattern-forming method which comprises the following steps:(1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer.(2) irradiating directly or through a photomask an actinic ray or host wave thereonto so as to obtain a predetermined pattern.(3) subjecting the actinic ray-curable coating film layer to a developing treatment to form a resist pattern coating film consisting of the actinic ray-curable coating film layer,(4) and subjecting the insulating film-forming resin layer to a developing treatment, followed by removing.