发明名称 Pattern forming method and pattern forming device
摘要 A pattern forming method has the steps of: forming a pattern by discharging droplets of a conductive material forming solution onto an insulating substrate; forming a conductive layer pattern on the pattern by discharging droplets of a solution which becomes a growth core; and forming a metal pattern by immersing the conductive layer pattern in a plating liquid. The pattern forming method may further have the step of forming a protective layer on a surface of the metal pattern by discharging droplets of an insulating material forming solution except at regions which are to become electrodes of the metal pattern.
申请公布号 US2003228743(A1) 申请公布日期 2003.12.11
申请号 US20030456487 申请日期 2003.06.09
申请人 FUJI PHOTO FILM CO., LTD. 发明人 FUKUNAGA TOSHIAKI;SAWANO MITSURU
分类号 H05K3/28;C25D5/02;C25D7/12;H01L21/3205;H05K1/16;H05K3/10;H05K3/12;H05K3/18;H05K3/46;(IPC1-7):H01L21/20;H01L21/44;B41J2/015;B41J2/14;H01L21/00 主分类号 H05K3/28
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