发明名称 |
Pattern forming method and pattern forming device |
摘要 |
A pattern forming method has the steps of: forming a pattern by discharging droplets of a conductive material forming solution onto an insulating substrate; forming a conductive layer pattern on the pattern by discharging droplets of a solution which becomes a growth core; and forming a metal pattern by immersing the conductive layer pattern in a plating liquid. The pattern forming method may further have the step of forming a protective layer on a surface of the metal pattern by discharging droplets of an insulating material forming solution except at regions which are to become electrodes of the metal pattern.
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申请公布号 |
US2003228743(A1) |
申请公布日期 |
2003.12.11 |
申请号 |
US20030456487 |
申请日期 |
2003.06.09 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
FUKUNAGA TOSHIAKI;SAWANO MITSURU |
分类号 |
H05K3/28;C25D5/02;C25D7/12;H01L21/3205;H05K1/16;H05K3/10;H05K3/12;H05K3/18;H05K3/46;(IPC1-7):H01L21/20;H01L21/44;B41J2/015;B41J2/14;H01L21/00 |
主分类号 |
H05K3/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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