发明名称 |
High-PTF sputtering targets and method of manufacturing |
摘要 |
A target for a deposition apparatus is formed by blending at least two different types of powders together and consolidating the powders with a powder metallurgy process to form a billet. The target is then formed from the billet. The target includes a first material phase having a first PTF and a second material phase having a second PTF higher than the first PTF. The second PTF is also higher than a PTF of a material having the same chemistry as the target.
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申请公布号 |
US2003228238(A1) |
申请公布日期 |
2003.12.11 |
申请号 |
US20020163620 |
申请日期 |
2002.06.07 |
申请人 |
ZHANG WENJUN;KUNKEL BERND;DEODUTT ANAND;BARTHOLOMEUSZ MICHAEL |
发明人 |
ZHANG WENJUN;KUNKEL BERND;DEODUTT ANAND;BARTHOLOMEUSZ MICHAEL |
分类号 |
B22F1/00;C23C14/34;G11B5/851;(IPC1-7):B22F1/00 |
主分类号 |
B22F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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