发明名称 CLEANING COMPOSITIONS
摘要 <p>Cleaning compositions and methods of use thereof are described. A representative cleaning composition includes about 0.2% to about 25% of a surfactant and one or more of the following components: about 5% to about 99% of a builder, about 5% to about 95% of a hydrotrope, about 2% to about 60% of a water conditioner, about 0.1% to about 35% of an alkali, and about 2% to about 85% of a processing aid.</p>
申请公布号 WO2003102120(P1) 申请公布日期 2003.12.11
申请号 US2003017109 申请日期 2003.05.30
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