发明名称 |
High order silane composition, and method of forming silicon film using the composition |
摘要 |
It is an object of the present invention to provide a high order silane composition that contains a polysilane having a higher molecular weight than conventionally, this being from the viewpoints of wettability when applying onto a substrate, boiling point and safety, and hence in particular enables a high-quality silicon film to be formed easily, and also a method of forming an excellent silicon film using the composition. The present invention attains this object by providing a high order silane composition containing a polysilane obtained through photopolymerization by irradiating a solution of a photopolymerizable silane or a photopolymerizable like-liquid silane with ultraviolet light. Moreover, the present invention provides a method of forming a silicon film comprising the step of applying such a high order silane composition onto a substrate.
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申请公布号 |
US2003229190(A1) |
申请公布日期 |
2003.12.11 |
申请号 |
US20030420521 |
申请日期 |
2003.04.22 |
申请人 |
AOKI TAKASHI;FURUSAWA MASAHIRO;MATSUKI YASUO;IWASAWA HARUO;TAKEUCHI YASUMASA |
发明人 |
AOKI TAKASHI;FURUSAWA MASAHIRO;MATSUKI YASUO;IWASAWA HARUO;TAKEUCHI YASUMASA |
分类号 |
C01B33/029;C01B33/04;C08G77/60;C09D183/16;H01L21/208;H01L21/368;(IPC1-7):C08F30/08 |
主分类号 |
C01B33/029 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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