发明名称 |
SUSCEPTOR WITH EPITAXIAL GROWTH CONTROL DEVICES AND EPITAXIAL REACTOR USING THE SAME |
摘要 |
A susceptor (1) for epitaxial growth reactors comprises a body (2) having a lower base (3), an upper top (4) and some substantially flat side faces (5); the side faces are adapted to receive, in predetermined areas (6), substrates on which the epitaxial growth develops; body (2) is provided with edge side regions (7) defined by couples of adjacent side faces (5); along edge side regions (7) in the upper part of body (2) there are provided first ribs (8) adapted to control the flow of reaction gases along side faces (5); along edge side regions (7) in the lower part of body (2) there are provided second ribs (9) adapted to control the flow of reaction gases along side faces (5). |
申请公布号 |
WO03023093(A3) |
申请公布日期 |
2003.12.11 |
申请号 |
WO2002EP10043 |
申请日期 |
2002.09.05 |
申请人 |
LPE SPA;PRETI, FRANCO;YARLAGADDA, SRINIVAS |
发明人 |
PRETI, FRANCO;YARLAGADDA, SRINIVAS |
分类号 |
C23C16/455;C23C16/44;C23C16/458;C30B25/12;H01L21/205;H01L21/683 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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