发明名称 PROJECTION SYSTEM FOR EUV LITHOGRAPHY
摘要 An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the mirror (3), a fourth mirror (M4), a fith mirror (M5) and a sith mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
申请公布号 WO02056114(A3) 申请公布日期 2003.12.11
申请号 WO2002EP00030 申请日期 2002.01.04
申请人 CARL ZEISS SMT AG;MANN, HANS-JUERGEN;HUDYMA, RUSSELL 发明人 MANN, HANS-JUERGEN;HUDYMA, RUSSELL
分类号 G02B17/00;G03F7/20;H01L21/027 主分类号 G02B17/00
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