| 摘要 |
An inspection apparatus (1) comprises an image pickup part (2) for performing an image pickup of a substrate (9), an operation part (4) to which an image signal is inputted from said image pickup part (2) and a computer (5), and the operation part (4) specifies an inspection image and a reference image from an object image acquired by the image pickup part (2). In the operation part (4), a class teaching part (501) generates a teaching image from the inspection image and an image sampling part (502) samples a plurality of pixels from the teaching image while a feature value calculation part (43) calculates pixel feature values from values of corresponding pixels in the inspection image and the reference image. A dataset generation part (503) generates a dataset of pixel feature values and a class on each of the sampled pixels. A classifier construction part (504) performs training with the dataset to generate a defect check condition and the defect check condition is inputted to an inspection result generation part (44). With this operation, the inspection apparatus (1) can efficiently and appropriately detect defects.
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