| 摘要 |
An apparatus for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, comprising a source emitting electromagnetic radiation onto an object plane, an SLM comprising a plurality of on-off object pixels, adapted to receive and modulating said electromagnetic radiation at said object plane in accordance to an input pattern description and to relay said electromagnetic radiation toward said work piece, a synchroniser to synchronise the motion of the work piece relative to a relayed patter description from said SLM onto said work piece, and an image-deflecting element arranged between said SLM and said work piece adapted to deflect said relayed pattern description. The apparatus also comprises, a scanning element to scan at least one beam from said radiation source over said radiation sensitive material. The SLM modulates said at least one beam during scanning according to an input pattern data file, where said modulation of the beam creates a coherent sub-images on the work piece and several sub-images are non-coherently superposed to create a final image. The invention also relates to a method of patterning a work piece and a work piece as such. |
