| 摘要 |
<p>A method forms a feature pattern on a substrate by exposing the substrate (726 of Figure 17), using a mask (722 of Figure 17) having a pattern of features (832 of Figure 17) thereon, with illumination having a first set of settings (23 of Figure 17). The substrate is exposed a second time, using the same mask having the pattern of features thereon, with illumination having a second set of settings (723 of Figure 17). The mask having the pattern of features thereon remains stationary between the two illumination exposures of the substrate.</p> |
