发明名称 PREVENTATIVE MAINTENANCE AIDED TOOL FOR CVD CHAMBER
摘要 A preventative maintenance tool which may be installed on a metal chemical vapor deposition (CVD) chamber to prevent escape of contaminating and toxic gases from the chamber interior during preventative maintenance (PM) cleaning of the chamber. The tool comprises a cylindrical tool body which fits to the lid O-ring of the chamber to form a gas-tight seal therewith; a vacuum line connector nipple extending from the body for connection to a vacuum line; and a lid panel rotatably mounted in the body and fitted with a pair of hinged closing panels for reversibly sealing the chamber and facilitating chamber cleaning.
申请公布号 US2003228751(A1) 申请公布日期 2003.12.11
申请号 US20020165541 申请日期 2002.06.08
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIAO MIAO-CHENG;WANG YING-LANG;LIANG HUNG-HSIN;CHENG HSIANG-SHENG;SHU SHENG-TE;YANG CHIH-YUAN
分类号 C23C16/44;H01L21/00;(IPC1-7):C23C16/00;C23F1/00;H01L21/476;H01L21/306;H01L21/44 主分类号 C23C16/44
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