发明名称 |
Pattern image comparison method, pattern image comparison device, and program |
摘要 |
A pattern image comparison method is provided which comprises a first input step of inputting a first pattern image based on design data for a reticle mask or a semiconductor device; a second input step of inputting a second pattern image of the reticle mask or semiconductor device manufactured based on the design data; a calculation step of calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of the first pattern image and the second pattern image; and an output step of outputting a result of comparison of a pattern on the reticle mask or semiconductor device and a pattern of the design data based on the calculated parameters of the first and second pattern images. |
申请公布号 |
US2003228048(A1) |
申请公布日期 |
2003.12.11 |
申请号 |
US20030393980 |
申请日期 |
2003.03.24 |
申请人 |
FUJITSU LIMITED |
发明人 |
OKADA TOMOYUKI;MAKINO SEIJI;SUZUKI KOUICHI;ITO TAKAHISA |
分类号 |
G03F1/08;G03F1/00;G03F1/68;G03F1/84;G06T7/00;G06T7/60;H01L21/027;(IPC1-7):G06K9/00;G06K9/62;G06K9/46 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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