ORIFICE LEAK GENERATION PREVENTING APPARATUS OF SEMICONDUCTOR MANUFACTURING EQUIPMENT

摘要

PURPOSE: An orifice leak generation preventing apparatus of a semiconductor manufacturing equipment is provided to be capable of preventing powder from being deposited at an injector of a chamber. CONSTITUTION: An orifice leak generation preventing apparatus of a semiconductor manufacturing equipment is provided with an orifice body part(50), an exhaust pipe(58) formed at the bottom portion of the orifice body part, and a groove(62) formed around the exhaust pipe. The orifice leak generation preventing apparatus further includes an exhaust manifold(60) and an inlet pipe(56) formed at the upper portion of the exhaust manifold for being fixed to the groove of the orifice. At this time, the exhaust manifold and the inlet pipe are formed as one piece.