发明名称 Lithographic apparatus and device manufacturing method
摘要 A multi-optical-layer optical element of a lithographic projection apparatus in which at least one optical layer is comprised of an alloy of Mo and Cr. That layer may form the outer most layer of a Mo/Si layer system with an optional protective outer coating of Ru. Furthermore, the multi-optical-layer optical element may be comprised of a plurality of interposed between Mo/Cr alloyed layers. <IMAGE>
申请公布号 EP1369744(A1) 申请公布日期 2003.12.10
申请号 EP20030253495 申请日期 2003.06.04
申请人 ASML NETHERLANDS B.V. 发明人 KURT, RALPH
分类号 G02B1/10;G02B1/11;G03F7/20;G21K1/06 主分类号 G02B1/10
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