| 发明名称 |
Polymers, resist compositions and patterning process |
| 摘要 |
A polymer having fluorinated vinyl phenol units copolymerized with acrylonitrile units has high transmittance to VUV radiation. A resist composition using the polymer as a base resin has high sensitivity and resolution to high-energy radiation and good plasma etching resistance and is suited for lithographic microprocessing.
|
| 申请公布号 |
US6660447(B2) |
申请公布日期 |
2003.12.09 |
| 申请号 |
US20010947767 |
申请日期 |
2001.09.07 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD.;MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;HARADA YUJI;WATANABE JUN;SASAGO MASARU;ENDO MASAYUKI;KISHIMURA SHINJI |
| 分类号 |
C08F212/14;G03F7/039;(IPC1-7):G03F7/004;C08F12/02 |
主分类号 |
C08F212/14 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
