| 摘要 |
A projection optical system and method projects and forms an image of a pattern arrayed on a first surface (mask), and exhibiting a periodicity in a predetermined direction (X- or Y-direction), on a second surface (wafer). A stop has an aperture showing a line symmetry with respect to a symmetric axis intersecting an optical axis of the projection optical system and extending in a direction (Y- or X-direction) orthogonal to the predetermined direction and having the outline at least a part of which are rectilinear portions. The stop is disposed on a Fourier transform plane of the first surface within the projection optical system or a surface in the vicinity thereof.
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