发明名称 |
Chemical solution feeding apparatus and method for preparing slurry |
摘要 |
An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.
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申请公布号 |
US6659634(B2) |
申请公布日期 |
2003.12.09 |
申请号 |
US20020282116 |
申请日期 |
2002.10.29 |
申请人 |
FUJITSU VLSI LIMITED |
发明人 |
HIRAOKA NAOKI;OSUDA HIROSHI;YAMAMOTO HOTAKA |
分类号 |
B01F3/08;B01F5/10;B01F15/04;B24B37/04;B24B57/04;H01L21/304;(IPC1-7):E03B1/00;F17D1/00 |
主分类号 |
B01F3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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