发明名称 Chemical solution feeding apparatus and method for preparing slurry
摘要 An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.
申请公布号 US6659634(B2) 申请公布日期 2003.12.09
申请号 US20020282116 申请日期 2002.10.29
申请人 FUJITSU VLSI LIMITED 发明人 HIRAOKA NAOKI;OSUDA HIROSHI;YAMAMOTO HOTAKA
分类号 B01F3/08;B01F5/10;B01F15/04;B24B37/04;B24B57/04;H01L21/304;(IPC1-7):E03B1/00;F17D1/00 主分类号 B01F3/08
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