发明名称 |
Shot averaging for fine pattern alignment with minimal throughput loss |
摘要 |
A way to average alignment measurements that obtains the advantage of multiple alignment marks per shot without requiring actual measurement of all alignment marks on all wafers of a batch. All alignment marks on all sampled shots are measured and averaged on the first wafer of a batch. The offset between a single sampled alignment mark and the average total offset for the wafer is characterized and applied when that alignment mark is sampled on succeeding wafers.
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申请公布号 |
US6661517(B2) |
申请公布日期 |
2003.12.09 |
申请号 |
US20020178241 |
申请日期 |
2002.06.25 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
MARINI EDWARD J. |
分类号 |
G03F9/00;(IPC1-7):G01B11/00;H01L21/76 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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