| 摘要 |
The present invention relates to a fuse and a method for forming a fuse over a semiconductor substrate. The fuse comprises forming a first contact member and a second contact member over a respective first region and a second region of a patterned, electrically-conductive silicide layer, wherein the first contact member and the second contact member electrically contact the silicide layer, thereby defining a first interface and a second interface, respectively. A first contact area and a second contact area are associated with the respective first contact member and second contact member, wherein the first contact area is larger than the second contact area, thereby defining a fusible link at the second interface. According to one example, the silicide resides over a patterned polysilicon layer, wherein the patterned polysilicon layer generally tapered, and wherein the first region is wider than the second region.
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