发明名称 APPARATUS FOR MEASURING TEMPERATURE OF OUTER WALL OF CHAMBER IN HIGH TEMPERATURE UNDOPED FILM DEPOSITION EQUIPMENT
摘要 PURPOSE: An apparatus for measuring a temperature of an outer wall of a chamber in high temperature undoped film deposition equipment is provided to prevent particles from being generated during a high temperature undoped silicate glass deposition process by rapidly control the temperature at the outer wall of the chamber. CONSTITUTION: A temperature measuring device(B) is aligned to make contact with an outer wall(A) of a chamber of deposition equipment. The temperature measuring device includes a thermal source detecting section(C) generating thermal electromotive force and a meter(101) for displaying the temperature corresponding to thermal electromotive force. The meter displays the temperature by detecting thermal electromotive force induced into the thermal source detecting section. The temperature measuring device is supported by a supporter(103) having a position adjusting device(102). The thermal source detecting section has a protecting pipe, a thermostat, a thermostat supporter and oxide metal powder.
申请公布号 KR20030092305(A) 申请公布日期 2003.12.06
申请号 KR20020029926 申请日期 2002.05.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAEK, SEON GYEONG
分类号 G01K7/02;(IPC1-7):G01K7/02 主分类号 G01K7/02
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