RETICLE, EXPOSURE EQUIPMENT AND EXPOSURE METHOD THEREOF FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A reticle, an exposure equipment and an exposure method thereof for manufacturing a semiconductor device are provided to be capable of improving the resolution of a photoresist pattern and obtaining fine line width at the photoresist pattern. CONSTITUTION: A reticle(35) is provided with a plate(30) for transmitting the light supplied from a light source, the first reticle pattern(40) formed on the upper surface of the plate for forming the first predetermined pattern at the upper portion of a substrate, and the second reticle pattern(50) formed on the lower surface of the plate for forming the second predetermined pattern at the upper portion of the substrate. Preferably, the first and second reticle pattern are formed in order not to be overlapped with each other.