发明名称 |
GAS SUPPLY CONTROL APPARATUS IN SEMICONDUCTOR FABRICATING PROCESS |
摘要 |
PURPOSE: A gas supply control apparatus in a semiconductor fabricating process is provided to prevent a process defect caused by a malfunction of an electromagnetic valve by checking whether the valve breaks down or operates abnormally. CONSTITUTION: A pneumatic valve(110) is installed in a gas supply line. The electromagnetic valve(120) controls the pneumatic valve. A pneumatic line(130) connects the electromagnetic valve with the pneumatic valve. An interlock apparatus(140) checks the pressure of the pneumatic line to determine whether the electromagnetic valve malfunctions. A pressure sensor(142) detects the pressure of the pneumatic line. A controller(144) receives the data from the pressure sensor and compares the data with a control signal regarding the operation of the electromagnetic valve to determine whether an interlock occurs. The interlock apparatus includes the pressure sensor and the controller.
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申请公布号 |
KR20030092677(A) |
申请公布日期 |
2003.12.06 |
申请号 |
KR20020030418 |
申请日期 |
2002.05.30 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, GYEONG SU |
分类号 |
H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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