发明名称 GAS SUPPLY CONTROL APPARATUS IN SEMICONDUCTOR FABRICATING PROCESS
摘要 PURPOSE: A gas supply control apparatus in a semiconductor fabricating process is provided to prevent a process defect caused by a malfunction of an electromagnetic valve by checking whether the valve breaks down or operates abnormally. CONSTITUTION: A pneumatic valve(110) is installed in a gas supply line. The electromagnetic valve(120) controls the pneumatic valve. A pneumatic line(130) connects the electromagnetic valve with the pneumatic valve. An interlock apparatus(140) checks the pressure of the pneumatic line to determine whether the electromagnetic valve malfunctions. A pressure sensor(142) detects the pressure of the pneumatic line. A controller(144) receives the data from the pressure sensor and compares the data with a control signal regarding the operation of the electromagnetic valve to determine whether an interlock occurs. The interlock apparatus includes the pressure sensor and the controller.
申请公布号 KR20030092677(A) 申请公布日期 2003.12.06
申请号 KR20020030418 申请日期 2002.05.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, GYEONG SU
分类号 H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
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