EXPOSURE APPARATUS OF SEMICONDUCTOR EQUIPMENT

摘要

PURPOSE: An exposure apparatus of a semiconductor equipment is provided to be capable of preventing the warpage phenomenon of a reticle due to the increase of the size and weight of the reticle by using a reticle holder. CONSTITUTION: An exposure apparatus of a semiconductor equipment is provided with a reticle stage(70) for loading and aligning a reticle(50), a reticle holder(60) located at the upper portion of the reticle stage for preventing the warpage of the reticle by holding the upper and lower surface of the edge portion of the reticle, and a wafer stage for supporting and aligning a wafer. Preferably, the reticle holder includes an adsorption part(62) for adsorbing the reticle by using vacuum force and a vacuum line(64) connected with the adsorption part for supplying the vacuum force to the adsorption part.