| 摘要 |
<P>PROBLEM TO BE SOLVED: To maintain a stable plasma processing for a long period, regardless of a rise of electric conductivity of cooling water for cooling counter electrodes. <P>SOLUTION: This discharge plasma processing device has a structure for generating glow discharge plasma by applying an electric field between the counter electrodes 1 constituted of a pair of electrodes 2 and 3 facing each other with a prescribed interval. In the processing device, each of a cooling water circulating system 20 for cooling the electrode 2 on a high pressure side of the counter electrodes 1 and a cooling circulating system 30 for cooling the electrode 30 on a ground-contact side is separately formed. The cooling water circulating system 20 of the electrode 2 on the high pressure side is made to have a structure electrically independent from the cooling water circulating system 30 of the electrode 3 on the ground-contact side and a housing 10 of the processing device. <P>COPYRIGHT: (C)2004,JPO |
