| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas feed device which detects an inert gas containing impurities that exceed specifications and prevents the inert gas containing impurities that exceed specifications from flowing into an exposure device and to provide a gas feed method and an exposure system. SOLUTION: The gas feed device feeds gas into a prescribed space through a path. The gas feed device is equipped with a first detector for detecting the concentration of impurities contained in the gas in the path and a first switching means which is located below the first detector in the feed direction of the gas, provided on the path, and capable of selectively switching a gas feed path from one to another. When the first detector detects that the impurities exceed specifications, the gas feed path is changed to a prescribed path through the first switching means so as to reduce the concentration of the impurities contained in the gas that is fed to the prescribed space to the specifications or below. COPYRIGHT: (C)2004,JPO |
