| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing method and a device thereof, which are capable of restraining a developing solution from increasing in consumption and making lines uniform in width. SOLUTION: Pure water is fed from a pure water feed nozzle 40 to the surface center of a rotating rectangular LCD substrate G to form a pure water thin film, a developing solution is fed from a developing solution feed nozzle 42 to the surface center of the rotating LCD substrate G where a thin pure water film has been formed to form a developing solution thin film on the surface of the substrate G. Then, the developing solution is fed in a belt shape from the developing solution feed nozzle 42 to the surface of the substrate G from its one edge to the other edge to carry out a developing process, then rinse liquid is fed from a rise feed nozzle to the surface of the substrate G subjected to the developing process to clean the surface. By this setup, the developing solution can be restrained from increasing in consumption, and the lines can be made uniform in width. COPYRIGHT: (C)2004,JPO |
