发明名称 LAMINATED LAYER MASK AND ITS FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a mask whose forming process is simple, moreover, and which is adaptable even to a finer pitch of through-holes and to provide a forming method. SOLUTION: A laminated layer mask 10 is formed by laminating an unit mask 12 having cylindrical through-holes 121, 122 and an unit mask 14 having cylindrical through-holes 141, 142. The through-hole 121 and the through-hole 141, the through-hole 122 and the through-hole 142 are formed at the same position, respectively. The diameter of the through-hole 121 is smaller than the diameter of the through-hole 141, and the diameter of the through-hole 122 is smaller than the diameter of the through-hole 142. Thus, the laminated layer mask 10 is a mask with a step. The effect of an aspect ratio can be reduced because the aspect ratio affects only each of the unit masks 12, 14, and thereby, the finer pitch of the through-holes 121, etc., can be attained. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003347343(A) 申请公布日期 2003.12.05
申请号 JP20020157770 申请日期 2002.05.30
申请人 TAMURA SEISAKUSHO CO LTD 发明人 ONOZAKI JUNICHI;ANDO HARUHIKO;SHIRAI MASARU
分类号 H01L21/60;(IPC1-7):H01L21/60 主分类号 H01L21/60
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