发明名称 Shadow mask for cathode ray tube
摘要 A shadow mask for a cathode ray tube includes an aperture area having a plurality of apertures passing electron beams, a non-aperture area extending a predetermined distance from a circumference of the aperture area and a skirt extending a predetermined distance from an outside circumference of the non-aperture area and bent at a predetermined angle to the non-aperture area, wherein the aperture area has predetermined curvature radii, and wherein if a curvature radius in a horizontal direction of the aperture area is Rhs, and a curvature radius in a vertical direction is Rvs, the following condition is satisfied, 0.6<Rvs/Rhs<0.8.
申请公布号 US2003222562(A1) 申请公布日期 2003.12.04
申请号 US20030400631 申请日期 2003.03.28
申请人 SAMSUNG SDI CO., LTD. 发明人 JEON SANG-HO;PYUN DO-HUN
分类号 G03F5/00;H01J29/07;H01J29/74;H01J29/80;(IPC1-7):H01J29/80 主分类号 G03F5/00
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