发明名称 |
Positive resist composition |
摘要 |
A positive resist composition comprising: (A) a compound capable of generating an acid on exposure to active light rays or a radiation; (B) a resin which is insoluble or sparingly soluble in an alkali and becomes alkali-soluble by an action of an acid; and (D) an acyclic compound having at least three groups selected from a hydroxyl group and a substituted hydroxyl group.
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申请公布号 |
US2003224287(A1) |
申请公布日期 |
2003.12.04 |
申请号 |
US20030388408 |
申请日期 |
2003.03.17 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
FUJIMORI TORU |
分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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