METHOD FOR DETERMINING WAVEFRONT ABERRATIONS

摘要

The invention relates to a method for determining wavefront aberrations for the characterisation of the projection features of an optical projection system. According to said method, the measurement results of two different measurement methods that are carried out in succession are combined. At least one part of the aberration parameters that have been determined in the preceding first measurement method is assumed as a given for the determination of aberration parameters using the second measurement method and is used accordingly. A hybrid method is thus provided, in which the strengths of at least two measurement methods are used in combination and specific weaknesses of the methods can thus be avoided.