ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF

摘要

A polymer comprises an acetal-containing monomer unit having the general structure (I) and at least one of the fluorine-containing monomer units having the general structures (II) and (III) wherein R1, R4, R5 and R6 are each independently H, lower alkyl, CH2CO2R10, cyano, CH2CN, or halogen, wherein R10 is any alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl or siloxy or linear or cyclic polysiloxane group; R2 is CHR11R12 where R11 and R12 are each independently H, lower alkyl, cycloalkyl or aryl; A is a substituted or unsubstituted alkylene, cycloalkylene, alkylenecycloalkylene, or alkylenearylene; and R3 is linear, branched or cyclic fluoroalkyl group or SiR13R14R15 where R13, R14, and R15 are each independently alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl, siloxy, linear or cyclic polysiloxane or silsesquioxane alkyl group; B is an aryl, C(=O)-O-(CH2)X where x=0-4, lower alkyl, cycloalkyl, alkene cycloalkyl, silyl, siloxyl, or linear or cyclic polysiloxane group. R7 is H or an acid sensitive group; R8 and R9 are each independently H or -CN group; and y=0-4 and the use of these polymers in radiation sensitive compositions for exposure to actinic radiation, especially radiation of 157 nm.