发明名称 High throughput vaporizer
摘要 A two-stage vaporizer includes two vaporizing stages joined by a vaporization chamber located gravitationally below the first vaporizing stage and gravitationally above the second vaporizing stage. A separator covering an outlet within the vaporization chamber allows vaporized precursor from both vaporizing stages to pass through the outlet to chemical vapor deposition system and prevents any remaining liquid precursor from passing through the outlet. The liquid precursor is premixed with carrier gas just prior to entry into the vaporizer. Additional flows of carrier gas pass through the two vaporizing stages in opposite directions to carry the vaporized precursor to the outlet.
申请公布号 US2003222360(A1) 申请公布日期 2003.12.04
申请号 US20020157696 申请日期 2002.05.29
申请人 RANDIVE RAJUL V.;MESSNER WILLIAM J. 发明人 RANDIVE RAJUL V.;MESSNER WILLIAM J.
分类号 C23C16/448;(IPC1-7):B01F3/04 主分类号 C23C16/448
代理机构 代理人
主权项
地址