发明名称 |
METHOD FOR PRODUCING OPTICALLY TRANSPARENT REGIONS IN A SILICON SUBSTRATE |
摘要 |
The invention relates to a simple and cost-effective method for producing optically transparent regions (5, 6) in a silicon substrate (1) with which the optically transparent regions can be realized with any thickness and can be provided above a cavity located in the silicon substrate. To this end, at least one defined region (5, 6) of the silicon substrate (1) is firstly etched whereby rendering it porous. Afterwards, the defined porous region (5, 6) of the silicon substrate (1) is oxidized. |
申请公布号 |
WO02084748(A3) |
申请公布日期 |
2003.12.04 |
申请号 |
WO2002DE00798 |
申请日期 |
2002.03.05 |
申请人 |
ROBERT BOSCH GMBH;BENZEL, HUBERT;WEBER, HERIBERT;ARTMANN, HANS;SCHAEFER, FRANK |
发明人 |
BENZEL, HUBERT;WEBER, HERIBERT;ARTMANN, HANS;SCHAEFER, FRANK |
分类号 |
G01N21/03;B81C1/00;C25F3/12;C25F3/14;H01L21/306;H01L21/308 |
主分类号 |
G01N21/03 |
代理机构 |
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代理人 |
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