发明名称 METHOD OF PROVIDING A SUBSTRATE SURFACE WITH A PATTERNED LAYER
摘要 <p>A method of manufacturing a patterned layer (4) on a substrate comprises providing a substrate surface (2) with a dam structure (6) partitioning the substrate surface into a plurality of compartments for containing fluid from which regions of the patterned layer are obtainable, filling, using a wet deposition method, compartments with volumes of fluid and then obtaining from the volumes of fluid regions of the patterned layer. In order to obtain a patterned layer which has a relatively large thickness and a good uniformity in thickness, the filling and obtaining is done in several passes, each pass comprising filling a selection of compartments with fluid having a volume larger than the volume of the compartment and obtaining the corresponding regions therefrom, taking care that in no selection two compartments which are nearest-neighbor of each other are included.</p>
申请公布号 WO2003100860(P1) 申请公布日期 2003.12.04
申请号 IB2003001930 申请日期 2003.05.08
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