| 摘要 |
<p>A radiation-sensitive resin composition which comprises an alicyclic olefin resin, an acid generator, a crosslinking agent, a phenol compound having a specific structure, and a solvent. The composition can give a resin film having a low permittivity and excellent in transparency, resistance to thermal discoloration, resolution, retention of film thickness, pattern shape, etc. Also provided is a process for producing a substrate having a patterned resin film, which comprises using the radiation-sensitive resin composition.</p> |
