发明名称 Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same
摘要 A transferring method including providing a substrate, forming a transferred layer over the substrate, joining a transfer member to the transferred layer, and removing the transferred layer from the substrate. The transferring method further includes transferring the transferred layer to the transfer member and reusing the substrate for another transfer. The transferring method may also include providing a substrate, forming a separation layer over the substrate, forming a transferred layer over the separation layer, and partly cleaving the separation layer such that a part of the transferred layer is transferred to a transfer member in a given pattern. The transferring method may also include joining a transfer member to the transferred layer, removing the transferred layer from the substrate and transferring the transferred layer to the transfer member, these of which constitute a transfer process, the transfer process being repeatedly performed.
申请公布号 US2003224582(A1) 申请公布日期 2003.12.04
申请号 US20030420840 申请日期 2003.04.23
申请人 发明人 SHIMODA TATSUYA;INOUE SATOSHI;MIYAZAWA WAKAO
分类号 G02F1/1362;G02F1/1368;H01L21/68;H01L21/762;H01L21/77;H01L21/84;H01L27/12;(IPC1-7):H01L21/30;H01L21/46 主分类号 G02F1/1362
代理机构 代理人
主权项
地址