| 摘要 |
Effluent gas cleaning process and apparatus for effectively removing particulates in the 0.01 micron to 0.1 micron diameter range, and for removing water-soluble gaseous contaminants, by first bringing the effluent to a relatively high temperature and humidity in a first stage, and then exposing the effluent to copious quantities of small cool water droplets in a second stage, for particular combinations of: the first stage relative humidity; the first-to-second stage droplet temperature difference; the stage two water droplet mass flow rate vs. effluent flow rate; the second stage droplet size; the travel time of the effluent during exposure to the cool droplets; and the electrical charge state of the second stage water droplets and opposite charge state of the particulates. Said combinations enhance effluent cleaning through the combined operation of up to four distinct physical processes which can be made to occur during the second stage. |
