| 摘要 |
PROBLEM TO BE SOLVED: To provide parts for a film deposition apparatus for suppressing separation of a deposited film as much as possible during the film deposition on substrates in a vacuum chamber, and a vacuum film deposition apparatus having the parts. SOLUTION: A Ti thermal-sprayed film S of the thickness of 200μm, Vickers hardness (Hv) of≤200 and the surface roughness (Ra) of≥10μm is formed over an entire surface by performing the arc thermal spraying of Ti under a vacuum (for example, degree of vacuum of 10<SP>-3</SP>to 10<SP>-1</SP>Pa) on a SUS shutter sheet 7 with the surface roughness (Ra) of 4μm through glass bead blasting. The thickness to start separation of the deposited film of the shutter A with the Ti thermal-sprayed film S is 1.5 to 2 times that of shutters B, C and D with a Ti thermal-sprayed film without the above hardness and surface roughness. COPYRIGHT: (C)2004,JPO
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