| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition less liable to generate striation and improved in solvent solubility, uniformity in coating and line edge roughness. <P>SOLUTION: The photosensitive resin composition comprises a resin which is decomposed by the action of an acid having a specified structure to increase solubility in an alkali developer, a compound which generates an acid upon irradiation with an actinic ray or a radiation and a solvent prepared by blending one or more solvents having one or more fluorine atoms per molecule. <P>COPYRIGHT: (C)2004,JPO |
