发明名称 METHOD FOR MAKING PHOTONIC CRYSTAL
摘要 PROBLEM TO BE SOLVED: To make it possible to make a practical photonic crystal. SOLUTION: The photonic crystal having a column array structure is made by forming a metal thin film pattern (gold pattern) 25 on the surface of the (111) face single crystal silicon layer 23 on a substance layer (silicon dioxide layer)22 different from silicon in refractive index and growing silicon single crystal columns 26 on a metal thin film pattern formation part in a high- temperature silicon tetrachloride gas atmosphere to form the columns. Thus, columns having a very smooth surface, at most 10 nm in terms of a centerline average roughness Ra can be obtained. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003342097(A) 申请公布日期 2003.12.03
申请号 JP20020153860 申请日期 2002.05.28
申请人 JAPAN AVIATION ELECTRONICS INDUSTRY LTD 发明人 MORI KEIICHI
分类号 C30B29/06;C30B11/00;C30B25/00;G02B6/12;G02B6/122;G02B6/13;(IPC1-7):C30B29/06 主分类号 C30B29/06
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