| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To correctly grasp the eaves quantity of a phase shift mask without making a sectional observation of the phase shift mask and to guarantee the quality of the phase shift mask more securely. <P>SOLUTION: The method of measuring the eaves quantity of a circuit pattern 10 of an eaves type Levenson PSM 100 includes a stage of forming the circuit pattern 10 and a monitor pattern 20 of specified size on quartz-made blanks 1, a stage of forming step part 33A and 33B on the blanks 1 where the monitor pattern 20 and circuit pattern 10 are formed by performing anisotropic dry etching and isotropic wet etching, and a stage of removing the monitor pattern 20 from the blanks 1 where the step parts 33A and 33B are formed and measuring the size of a specified area 25 demarcated with the step part 33B right below the monitor pattern 20 as the eaves quantity. <P>COPYRIGHT: (C)2004,JPO</p> |
