| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive material having high sensitivity to a far ultraviolet radiation, an electron beam, an X-ray, etc., capable of developing in an alkali aqueous solution, and excellent in heat resistance, and its raw material. <P>SOLUTION: This photosensitive composition comprises a hydroxystyrene- based polymer composition comprising a hydroxystyrene (A) containing a repeated structural unit represented by general formula (1) and has a syndiotactic structure of not less than 30% by racemipentad and a hydroxystyrene (B) containing a repeated structural unit represented by general formula (1) and has atactic structure of less than 30% by racemipentad, and a photodecomposing photosensitive agent, an azide compound or an acid generating agent, and a crosslinking agent are compounded to it. <P>COPYRIGHT: (C)2004,JPO |
