发明名称 METHOD OF OBSERVING MICROSTRUCTURE AND EQUIPMENT FOR INSPECTING DEFECT
摘要 PROBLEM TO BE SOLVED: To realize an optical system in which an MTF improving effect can be attained in a high band without relying upon the direction of a pattern on a sample and the polarization state of illumination light can be switched even to linear polarization, as required. SOLUTION: In the defect inspection equipment, a means for focusing the image of an illuminated sample is equipped with an objective lens, aλ/4 plate and aλ/2 plate, whereλis the wavelength, an wavelength switching means for inserting/retracting theλ/4 plate and theλ/2 plate, individually, into/from the optical passage, a partial polarization beam splitter, an analyzer and an imaging lens. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003344306(A) 申请公布日期 2003.12.03
申请号 JP20020154896 申请日期 2002.05.29
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIMURA HIROSHI
分类号 G01N21/956;G01N21/88;G02B5/30;G02B21/06;G02B21/36;H01L21/66;(IPC1-7):G01N21/956 主分类号 G01N21/956
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