发明名称 Semiconductor device
摘要 <p>A semiconductor device includes a semiconductor substrate, a pair of low breakdown voltage elements formed in the substrate so as to be adjacent to each other, and a high breakdown voltage element formed to be adjacent to one of the low breakdown voltage elements. The pair of low breakdown voltage elements are isolated from each other by a pn junction and the one of the low breakdown voltage elements and the high breakdown voltage element are isolated from each other by a dielectric material. The semiconductor substrate is a composite substrate formed by directly bonding a first substrate serving as an element region to a second substrate serving as a supporting member through an insulating film.</p>
申请公布号 EP0721211(B1) 申请公布日期 2003.12.03
申请号 EP19960104114 申请日期 1989.02.06
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 NAKAGAWA, AKIO;FURUKAWA, KAZUYOSHI;OGURA, TSUNEO
分类号 H01L21/76;H01L21/761;H01L21/762;H01L21/763;H01L21/8222;H01L21/8234;H01L27/06;H01L27/08;H01L27/088;H01L27/12;H01L29/739;H01L29/78;(IPC1-7):H01L21/76 主分类号 H01L21/76
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