| 摘要 |
PROBLEM TO BE SOLVED: To provide a skin cleaning composition having excellent cleaning performance, especially performance to remove the cuticle plug consisting of sebum secreted from the sebaceous gland of the scalp and skin and exhibiting low stimulation and high safety and usable as a substitute for a hard scrubbing agent and a clay (mudstone) for the removal of the dirt in the spore or the old cuticle. SOLUTION: The skin cleaning composition is produced by compounding a skin cleaning composition containing a surfactant with one or more kinds of powdery polysaccharides, especially agar powder, cork powder and hardly soluble dextrin powder in powdery state without dissolving the powder. COPYRIGHT: (C)2004,JPO
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