发明名称 PLASMA APPARATUS AND PRODUCTION METHOD THEREOF
摘要 A plasma apparatus includes a container (11) having an opening, a dielectric member (13) supported by an end surface of an outer periphery of the opening of the container (11), an electromagnetic field supplying means for supplying an electromagnetic field into the container (11) through the dielectric member (13), and a shield member (12) covering the outer periphery of the dielectric member (13) and shielding the electromagnetic field. A distance L1 from an inner surface of the container (11) to an inner surface of the shield member (12) at an end surface of the container (11) is approximately N/2 (N is an integer not smaller than 0) times the wavelength of the electromagnetic field in an area (18) surrounded by the end surface of the container (11), the electromagnetic field supplying means and the shield member (12). <IMAGE>
申请公布号 EP1367639(A1) 申请公布日期 2003.12.03
申请号 EP20020712378 申请日期 2002.02.15
申请人 TOKYO ELECTRON LIMITED 发明人 ISHII, NOBUO
分类号 H05H1/46;B01J19/08;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 H05H1/46
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