SUBSTRATE GAS TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate gas treatment device allowing the transmission of rotation driving force outside a treatment chamber via a magnet coupling to rotating rollers in the treatment chamber in no contact therewith and preventing the leakage of treatment gas to the outside. SOLUTION: The substrate gas treatment device comprises a plurality of rotating shafts 7 to which feeding rollers 6 are coaxially fixed, journaled in parallel into the treatment chamber 5 so that treating objects 15 placed on the feeding rollers 6 are carried in a fixed direction, and a gas exhaust port provided in the treatment chamber so that the treatment gas is blown to the surfaces of the treating objects. A magnetic disc 18 on the driven side of the magnet coupling 17 and a magnetic disc 25 on the driving side thereof are located at the shaft end of the rotating shaft 7 in the treatment chamber and at a position spaced from a side wall 23 of the treatment chamber and opposed to the magnetic disc on the driven side, respectively. Rotating force supplied by a rotation driving source 22 installed outside the treatment chamber is transmitted via the magnet coupling to the feeding rollers in the treatment chamber in no contact therewith. COPYRIGHT: (C)2004,JPO