Device for Chemical Vapor Deposition (CVD) treatment of workpieces comprises a transport unit and at least one reactor (3) fixed to the transport unit. The device has a mechanical radial cam (15) and the reactor an opening and closing unit (13) operated by the radial cam. An Independent claim is also included for a process for CVD treatment of workpieces in a reactor.
申请公布号
EP1367145(A1)
申请公布日期
2003.12.03
申请号
EP20030011737
申请日期
2003.05.23
申请人
SCHOTT GLAS;CARL-ZEISS-STIFTUNG TRADING AS SCHOTT GLAS
发明人
ARNOLD, GREGOR;LUETTRINGHAUS-HENKEL, ANDREAS;BEHLE, STEPHAN, DR.;BICKER, MATTHIAS, DR.
