发明名称 METHOD OF PRODUCING INTERCONNECTS ON AN INTEGRATED CIRCUIT
摘要 <p>An interconnect arrangement ( 100 ) has a first layer ( 101 ), a first layer surface ( 102 ), thereon at least two interconnects ( 104 ) having a second layer surface ( 105 ) essentially parallel to the first layer surface ( 102 ), thereon a respective second layer ( 106 ) for each interconnect ( 104 ), the second layers ( 106 ) of adjacent interconnects covering regions between the adjacent interconnects ( 104 ), and thereon a third layer ( 107 ), which completely closes off the regions between the adjacent interconnects ( 104 ) by means of coverage.</p>
申请公布号 EP1366522(A2) 申请公布日期 2003.12.03
申请号 EP20020717985 申请日期 2002.03.01
申请人 INFINEON TECHNOLOGIES AG 发明人 ENGELHARDT, MANFRED;SCHINDLER, GUENTHER
分类号 H01L21/768;H01L23/522;H01L23/532;(IPC1-7):H01L23/522 主分类号 H01L21/768
代理机构 代理人
主权项
地址